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Home » Books » Polymers and Plastics » Chemistry - Polymer Types » Polyvinyl alcohol

 
Thin Film Materials Technology: Sputtering of Compound Materials


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Thin Film Materials Technology: Sputtering of Compound Materials
Author: Kiyotaka Wasa et al
ISBN 0-8155-1483-2

Published: 2004
pages 432

Price: $140.00 + S&H
  • Summary
  • Table of Contents
  • Author(s)
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An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics.
In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering.

Thin Film Materials and Devices
Thin Film Process
Thin Film Growth Process
Thin Film Deposition Process
Characterization
Sputtering Phenomena
Sputtering Yield
Sputtering Atoms
Mechanisms of Sputtering
Sputtering Systems
Discharge in a Gas
Sputtering System
Practical Aspects of Sputtering System
Deposition of Compound Thin Films
Oxides
Nitrides
Carbides and Silicides
Diamond
Selenides
Amorphous Thin Films
Super-Lattice Structures
Organic Thin Films
Magnetron Sputtering Under a Strong Magentic Field
Structural Control of Compound Thin Films
Ferroelectric Materials and Structures
Control of Structure
Nanometer Structures
Interfacial Control
Microfabrication by Sputtering
Classification by Sputtering Etching
Ion Beam Sputter Etching
Diode Sputter Etching
Deposition into Deep Trench Structure
Appendix
Electric Units, Their Symbols and Conversion
Factors
Fundamental Physical Constants
Index

Kiyotaka Wasa brings to this book over 40 years experience in the fields of radiation damage, gas discharge, plasma, cathodic sputtering and thin film technology with Matsushita Electric, Ltd. and Yokohama City University. A Ph.D. from Osaka University, his honors in surface science include awards from Japan and the United States. He has made seminal contributions to magnetron sputtering and developed numerous thin film materials and electronic devices including ZnO, diamond, and high-Tc superconducting thin films. Life Fellow of IEEE.

Makoto Kitabatake has studied a synthesis of novel materials by sputtering at Matsushita Electric, Ltd. and University of Illinois. He got Ph.D. from Tohoku University. He has seminal work in the low temperature growth of carbides and nitrides by ion beam sputtering. He has a seminal work on a growth of cubic diamond at room temperature and silicon carbide semiconducting devices.

Hideaki Adachi has studied a growth process of oxide compound thin films at Matsushita Electric, Ltd. A Ph.D. from Tohoku University, his honors in thin film materials include awards from Japan. He has seminal contribution to a synthesis of single crystal perovskite thin films and man-made superlattice of perovskite by sputtering. He has given a pioneer work in PLZT electro-optic switches, man-made high-Tc superconductors, and magnetic oxide devices.

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